THIN FILM

Research

The research in our group  is mainly concerned with the growth, characterization, manufacturing devices of III-nitride binary and hetero thin films by using different Chemical Vapor Deposition techniques (High Pressure Chemical Vapor Deposition-Atomic layer deposition – Low Pressure Metal Organic Chemical Vapor Deposition). III-Nitrite  is a crucial step in the manufacturing of blue, green LEDs, sensors operating from deep UV region to infrared region, integrated circuits (CMOS), semiconductor lasers, micro-electro-mechanical systems (MEMS) and many other devices. Research in this area is interdisciplinary. drawing on the fields of heat transfer, fluid dynamics, control, chemistry, electronics and materials science, among others.

Reseach Team:

  • Prof Dr. Mustafa Alevli (Thin film growth, optical, structural, surface and electrical characterization, device fabrication
  • Prof. Dr. Uğur Yahşi ( Thin film defect characterization)

Students:

  • Neşe Güngör

Colloborative Work

Selected publications:

  1. Sabri Alkis, Mustafa Alevli, Salamat Burzhuev, Huseyin Avni Vural, Ali Kemal Okyay, Bulend Ortaç, “Generation of InN Nanocrystals in Organic Solution Through Laser Ablation of HPCVD grown InN Thin Film”, Journal of Nanoparticle Research, DOI: 10.1007/s11051-012-1048-5.
  2. Mustafa Alevli, Cagla Ozgit, İnci Donmez, Necmi Biyikli, “Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures”, Physıca Status Solidi A-Applicatıons And Materials Science, 209(2012), pp.266-271.
  3. M. Alevli, G. Durkaya, A. Weerasekara, A. G. U. Perera, N. Dietz, W. Fenwick,  V. Woods, I. Ferguson, “Characterization of  InN Layers grown by High Pressure Chemical Vapor Depostion”, Applied Physics Letter , 89(2006), pp.112119-3.

 

For detailed info, you can visit http://scholar.google.com.tr/citations?user=0qG9LhoAAAAJ&hl=tr


This page updated by Physics on 10.04.2020 23:34:48

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